This inventor holds 6 USPTO granted patents and 1 published patent application. Top assignee: Mks Instruments, Inc.. Active years: 2001-2025.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Location History:
- Scotts Valley, CA (US) (2020)
- Santa Clara, CA (US) (2021)
- Morgan Hill, CA (US) (2001 - 2024)
Company Filing History:
Years Active: 2001-2025
Title: Innovations of James E Blessing
Introduction
James E Blessing is a notable inventor based in Santa Clara, CA (US). He has made significant contributions to the field of mass spectrometry, particularly in monitoring radical particle concentrations. With a total of 6 patents to his name, Blessing continues to push the boundaries of innovation in his field.
Latest Patents
One of Blessing's latest patents involves a monitoring system that detects and measures the quantity of radical particles within a gas. This system includes a test chamber coupled to a flow channel that transmits gas. The test chamber defines an aperture that allows a subset of the gas to enter from the flow channel. An ionizer within the test chamber generates radical ions from the radical particles of the gas subset. A mass spectrometer then measures the quantity of these radical ions, providing a precise measurement of the radical particles present in the gas.
Career Highlights
James E Blessing is currently associated with MKS Instruments, Inc., where he applies his expertise in mass spectrometry and gas analysis. His work has been instrumental in developing advanced monitoring systems that enhance the understanding of gas compositions and their implications in various applications.
Collaborations
Throughout his career, Blessing has collaborated with notable colleagues, including Jonathan Leslie and Jonathan Hugh Batey. These collaborations have contributed to the advancement of technologies in their respective fields.
Conclusion
James E Blessing's innovative work in mass spectrometry and his contributions to monitoring radical particle concentrations highlight his importance as an inventor. His ongoing efforts continue to influence the field and inspire future innovations.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
