The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 01, 2025

Filed:

Mar. 29, 2024
Applicant:

Mks Instruments, Inc., Andover, MA (US);

Inventors:

Chenglong Yang, Fremont, CA (US);

Jimmy Liu, San Jose, CA (US);

James Edward Blessing, Morgan Hill, CA (US);

Assignee:

MKS INSTRUMENTS, INC., Andover, MA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01N 27/623 (2021.01); H01J 49/28 (2006.01);
U.S. Cl.
CPC ...
G01N 27/623 (2021.01); H01J 49/282 (2013.01);
Abstract

A monitoring system detects and measures a quantity of radical particles within a gas. A test chamber is coupled to a flow channel that transmits a gas. The test chamber defines an aperture connecting the test chamber and the flow channel, and the aperture permits a subset of the gas to enter the test chamber from the flow channel. An ionizer is positioned within the test chamber and generates radical ions from radical particles of the subset of the gas. A mass spectrometer measures a quantity of the radical ions, thereby providing a measurement of the radical particles in the gas.


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