James C Meyer

Title: James C Meyer: Innovator in Dielectric Formation

Introduction

James C Meyer is a notable inventor based in Tualatin, OR (US). He has made significant contributions to the field of dielectric materials, particularly through his innovative patent. With a focus on enhancing the properties of dielectrics, Meyer has demonstrated his expertise and commitment to advancing technology.

Latest Patents

Meyer holds a patent for the "Formation of dielectric with smooth surface." This patent outlines techniques and configurations for creating a dielectric with a smooth surface. In one embodiment, the method involves providing a dielectric with first and second surfaces, a conductive feature formed on the first surface, and a laminate applied to the second surface. The process includes curing the second surface while the laminate remains applied and subsequently removing the laminate. This invention showcases Meyer's ingenuity in improving dielectric materials.

Career Highlights

James C Meyer is associated with Intel Corporation, a leading technology company known for its innovations in semiconductor manufacturing. His work at Intel has allowed him to contribute to cutting-edge developments in the field of electronics and materials science.

Collaborations

Meyer has collaborated with notable colleagues, including Deepak Arora and Daniel N Sobieski. These partnerships have likely fostered a creative environment that encourages innovation and the sharing of ideas.

Conclusion

James C Meyer is a distinguished inventor whose work in dielectric formation has the potential to impact various technological applications. His patent reflects a commitment to advancing material science, and his role at Intel Corporation underscores his importance in the industry.