IDiyas

For the Inventor, By the Inventor

Hwaseong-si, South Korea

Jaehyoung Choi

USPTO Granted Patents = 13 

Average Co-Inventor Count = 5.0

ph-index = 4

Forward Citations = 71(Granted Patents)


Company Filing History:

goldMedal13 out of 131,214 
 
Samsung Electronics Co., Ltd.
 patents

Years Active: 2011-2025

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13 patents (USPTO):
1. 12453077 - Capacitor and memory device (2025-10-21),
2. 12336202 - Integrated circuit device (2025-06-17),
3. 12029027 - Capacitor and memory device (2024-07-02),
4. 11990503 - Methods of fabricating capacitor and semiconductor device including the capacitor (2024-05-21),
5. 11901291 - Semiconductor devices including lower electrodes including inner protective layer and outer protective layer (2024-02-13),
6. 11678476 - Capacitor and DRAM device including the same (2023-06-13),
7. 10121793 - Semiconductor device having supporters and method of manufacturing the same (2018-11-06),
8. 10090377 - Semiconductor device including capacitor (2018-10-02),
9. 9847278 - Semiconductor devices having air spacers and methods of manufacturing the same (2017-12-19),
10. 9437419 - Method of forming a layer using a trialkylsilane silicon precursor compound (2016-09-06),
11. 8787082 - Semiconductor memory device comprising three-dimensional memory cell array (2014-07-22),
12. 8284601 - Semiconductor memory device comprising three-dimensional memory cell array (2012-10-09),
13. 7989877 - Semiconductor devices including a dielectric layer (2011-08-02),

Title: The Innovative Contributions of Jaehyoung Choi

Introduction

Jaehyoung Choi is a prominent inventor based in Hwaseong-si, South Korea. He has made significant contributions to the field of electronics, particularly in the development of advanced capacitor and memory devices. With a total of 13 patents to his name, Choi's work has had a substantial impact on the technology industry.

Latest Patents

Choi's latest patents include a capacitor and memory device that features a unique dielectric layer structure. This structure consists of a first zirconium oxide layer, a hafnium oxide layer, and a second zirconium oxide layer, all sequentially stacked. The upper electrode is positioned on this dielectric layer structure, which enhances the performance of the device. Another notable patent is for an integrated circuit device that includes a lower electrode on a substrate, supported by an insulating support pattern. This device also incorporates a high-k interface layer made of zirconium oxide, which plays a crucial role in its functionality.

Career Highlights

Jaehyoung Choi is currently employed at Samsung Electronics Co., Ltd., where he continues to innovate and develop cutting-edge technologies. His work has been instrumental in advancing the capabilities of electronic devices, making them more efficient and reliable.

Collaborations

Choi has collaborated with notable colleagues such as Cheoljin Cho and Younsoo Kim. Their combined expertise has contributed to the successful development of various technologies and patents.

Conclusion

Jaehyoung Choi's contributions to the field of electronics through his innovative patents and collaborations highlight his importance as an inventor. His work continues to influence the technology landscape, paving the way for future advancements.

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