Jae Hoon Park

Title: Innovations by Jae Hoon Park

Introduction

Jae Hoon Park is a notable inventor based in Gwangju-si, South Korea. He has made significant contributions to the field of substrate treatment technology. With a total of 2 patents to his name, Park continues to push the boundaries of innovation in his industry.

Latest Patents

One of his latest patents is titled "Apparatus for treating substrate and method for treating a substrate." This inventive concept provides a substrate treating method that includes a first treating process, which involves supplying a first liquid to a rotating substrate. Following this, a second treating process supplies a second liquid to the rotating substrate, with the rotation speed of the substrate being adjusted during the first liquid's application.

Another significant patent is "Treating vessel and liquid processing apparatus." This patent describes a substrate treating apparatus that consists of a treating vessel with an outer cup and an inner cup. The design allows for a recollecting route for liquid, enhancing the efficiency of the treatment process. The apparatus also features a rotatable spin head with a cleaning jig, and a first protrusion that directs cleaning liquid towards the inner cup's surface.

Career Highlights

Jae Hoon Park is currently employed at Semes Co., Ltd., where he applies his expertise in substrate treatment technologies. His work has been instrumental in developing innovative solutions that improve the efficiency and effectiveness of substrate processing.

Collaborations

Throughout his career, Park has collaborated with talented individuals such as Dae Sung Kim and Sang Eun Noh. These partnerships have fostered a creative environment that encourages the development of groundbreaking technologies.

Conclusion

Jae Hoon Park's contributions to substrate treatment technology exemplify the spirit of innovation. His patents reflect a commitment to advancing the field and improving processes within the industry. His work at Semes Co., Ltd. continues to inspire future developments in substrate treatment solutions.