Semes Co., Ltd.

Jae Hoon Park

Dae Sung Kim

Min Jung Park

Sang Eun Noh

Seo Jung Park

Kyung Jin Seo

Ho Jin Jang

Young Seo An

Soo Bin Yong

Dae Myeong Lee

Nam Kyu Kim

Jae Hyun Lim

A substrate treating apparatus includes: a spin chuck supporting a substrate; a rinse liquid supply unit supplying a rinse liquid; a first bowl including an inclined surface inclined downward in an outward direction of the spin chuck; and a guide part provided on the inclined surface of the first bowl so as to form a spiral surrounding the spin chuck and guiding a flow of the rinse liquid along the spiral.

Substrate treating apparatus

The inventive concept provides a substrate treating method. The substrate treating apparatus includes first treating including supplying a first liquid to a rotating substrate; and second treating including supplying a second liquid to the rotating substrate after the supplying of the first liquid, and wherein a rotation speed of a substrate is changed during the supplying of the first liquid to the rotating substrate.

Apparatus for treating substrate and method for treating a substrate

The inventive concept provides a substrate treating apparatus. The substrate treating apparatus comprising: a treating vessel including an outer cup and an inner cup placed in an inner side of the outer cup, the inner cup and the outer cup in combination defining a recollecting route for a recollecting a liquid; a rotatable spin head placed within the treating vessel on which a cleaning jig is placed; wherein the treating vessel comprises a first protrusion protruding from an inner side surface of the outer cup to direct a cleaning liquid scattering from the cleaning jig toward a surface of the inner cup.

Treating vessel and liquid processing apparatus

Growing community of inventors

Gwangju-si, South Korea

Jae Hoon Park