The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 07, 2025

Filed:

Jun. 12, 2023
Applicant:

Semes Co., Ltd., Cheonan-si, KR;

Inventors:

Min Jung Park, Cheonan-si, KR;

Soo Bin Yong, Cheonan-si, KR;

Jae Hoon Park, Cheonan-si, KR;

Assignee:

SEMES CO., LTD., Chungcheongnam-Do, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/16 (2006.01); G03F 1/56 (2012.01); H01L 21/02 (2006.01); H01L 21/47 (2006.01); H01L 21/67 (2006.01);
U.S. Cl.
CPC ...
G03F 7/162 (2013.01); G03F 1/56 (2013.01); H01L 21/02282 (2013.01); H01L 21/47 (2013.01); H01L 21/67034 (2013.01);
Abstract

The inventive concept provides a substrate treating method. The substrate treating apparatus includes first treating including supplying a first liquid to a rotating substrate; and second treating including supplying a second liquid to the rotating substrate after the supplying of the first liquid, and wherein a rotation speed of a substrate is changed during the supplying of the first liquid to the rotating substrate.


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