The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 16, 2025

Filed:

Mar. 24, 2023
Applicant:

Semes Co., Ltd., Chungcheongnam-do, KR;

Inventors:

Young Seo An, Gyeonggi-do, KR;

Jae Hoon Park, Gyeonggi-do, KR;

Young Ju Jo, Gyeonggi-do, KR;

Kyung Jin Seo, Chungcheongnam-do, KR;

Seo Jung Park, Gyeonggi-do, KR;

Dae Myeong Lee, Busan, KR;

Jae Hyun Lim, Chungcheongnam-do, KR;

Nam Kyu Kim, Chungcheongnam-do, KR;

Assignee:

SEMES CO., LTD., Chungcheongnam-do, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B08B 9/093 (2006.01); B08B 3/02 (2006.01); G03F 7/16 (2006.01);
U.S. Cl.
CPC ...
B08B 9/093 (2013.01); B08B 3/022 (2013.01); G03F 7/168 (2013.01); B08B 2203/027 (2013.01); B08B 2209/08 (2013.01);
Abstract

A substrate treating apparatus includes: a spin chuck supporting a substrate; a rinse liquid supply unit supplying a rinse liquid; a first bowl including an inclined surface inclined downward in an outward direction of the spin chuck; and a guide part provided on the inclined surface of the first bowl so as to form a spiral surrounding the spin chuck and guiding a flow of the rinse liquid along the spiral.


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