Jae-eon Park

Title: Innovations of Jae-eon Park in Integrated Circuit Technology

Introduction

Jae-eon Park is a notable inventor based in Gyeonggi-do, South Korea. He has made significant contributions to the field of integrated circuit technology, holding a total of 6 patents. His work focuses on methods that enhance the performance and reliability of semiconductor devices.

Latest Patents

Among his latest patents, Jae-eon Park has developed methods for forming integrated circuit devices that incorporate ion-cured electrically insulating layers. This innovative approach involves creating a trench in a semiconductor substrate and filling it with an electrically insulating region that contains a seam. The process includes implanting curing ions, such as nitrogen, phosphorus, and boron, at specific energies and doses to improve atomic order within the insulating region.

Another significant patent involves the formation of CMOS integrated circuit devices with stressed NMOS and PMOS channel regions. This method includes the creation of multiple transistors in a semiconductor substrate, which are then covered with electrically insulating layers that apply net stress to the channel regions. This technique enhances the performance of the transistors by optimizing their operational characteristics.

Career Highlights

Jae-eon Park has worked with prominent companies in the semiconductor industry, including Samsung Electronics and Chartered Semiconductor Manufacturing. His experience in these organizations has allowed him to refine his expertise in integrated circuit technology and contribute to groundbreaking innovations.

Collaborations

Throughout his career, Jae-eon Park has collaborated with talented individuals such as Ja-hum Ku and Jun-jung Kim. These partnerships have fostered a creative environment that has led to the development of advanced technologies in the semiconductor field.

Conclusion

Jae-eon Park's contributions to integrated circuit technology through his innovative patents and collaborations highlight his importance in the field. His work continues to influence the development of more efficient and reliable semiconductor devices.