Fremont, CA, United States of America

Jack Chen

USPTO Granted Patents = 24 

Average Co-Inventor Count = 3.2

ph-index = 9

Forward Citations = 204(Granted Patents)


Location History:

  • Urbana, IL (US) (2005 - 2009)
  • Freemont, CA (US) (2010)
  • Fremont, CA (US) (2009 - 2017)
  • San Francisco, CA (US) (2021 - 2023)

Company Filing History:


Years Active: 2005-2025

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24 patents (USPTO):Explore Patents

Title: Innovations by Jack Chen: A Trailblazer in Plasma Technology

Introduction

Jack Chen is a prolific inventor based in Fremont, California, with an impressive portfolio of 22 patents. His groundbreaking work focuses on advancements in plasma processing technologies, particularly in semiconductor substrate cleaning and etching. This article explores his latest patents, career highlights, and collaborations that have significantly impacted the field.

Latest Patents

Among his most recent innovations, Jack Chen holds patents for a "Tunable Upper Plasma-Exclusion-Zone Ring for a Bevel Etcher." This invention is designed to optimize the distance of plasma during processing in a chamber. The PEZ ring features a unique structure with a lower surface that includes a horizontal portion and an upwardly tapered conical outer portion, enabling the adjustment of plasma treatment distances for 300 mm circular substrates. His innovation ensures precision in cleaning and processing, allowing the extent of the bevel edge to be adjusted radially both inward and outward during the bevel cleaning process using radio frequency power sources. This technology marks a significant advancement in semiconductor manufacturing efficiency.

Career Highlights

Jack Chen has made substantial contributions through his work at various prestigious organizations. He has worked with Lam Research Corporation, a leading provider of semiconductor manufacturing equipment. His role there was pivotal in developing advanced plasma processing techniques that are fundamental in the semiconductor fabrication process. Additionally, his experience at the University of Illinois has allowed him to bridge academia with industry, fostering innovation and research.

Collaborations

Throughout his career, Jack has collaborated with many talented professionals, including Chang Po Liu and Andrew D Bailey, III. These collaborations have been essential in driving forward the technological advancements in his fields of expertise, combining their knowledge and skills to tackle complex challenges in semiconductor processing.

Conclusion

Jack Chen exemplifies innovation in the realm of plasma technology, with his extensive patent portfolio reflecting his dedication to advancing semiconductor processing. His latest inventions not only enhance the efficiency of manufacturing but also set new standards in the industry. As he continues to innovate and collaborate, the impact of his work will likely shape the future of semiconductor technologies.

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