Suwon, South Korea

Ja-hyung Han

This inventor holds 5 USPTO granted patents. Top assignee: Samsung Electronics Co., Ltd.. Active years: 2002-2007.


% Patents Active = 60.0

Average Co-Inventor Count = 1.8

ph-index = 3

Forward Citations = 32(Granted Patents)


Location History:

  • Suwon, KR (2002 - 2005)
  • Suwon-si, KR (2005 - 2007)

Company Filing History:


Years Active: 2002-2007

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5 patents (USPTO):Explore Patents

Title: Innovations of Ja-hyung Han

Introduction

Ja-hyung Han is a notable inventor based in Suwon, South Korea. He has made significant contributions to the field of chemical mechanical polishing, with a focus on enhancing the efficiency and effectiveness of polishing processes. With a total of 5 patents to his name, Han's work is recognized for its innovative approaches to solving complex engineering challenges.

Latest Patents

Han's latest patents include a variety of advanced technologies. One of his notable inventions is a retainer ring designed to reduce heat generated during the polishing process. This retainer ring incorporates a heat absorbing element, a thermoelectric element, and a heat dissipating element. Additionally, he has developed a polishing head that is configured to polish a wafer, which includes a wafer carrier, a retainer ring, and a cooling element. Another significant invention is a chemical mechanical polishing apparatus that features a polishing pad formed on a platen and a polishing head that includes a retainer ring. Furthermore, Han has created methods and apparatuses for polishing a copper layer, which involve removing Cu oxide created by surface oxidation from the wafer. This innovative method ensures that process failures, such as scratches caused by remnants of Cu oxide during subsequent polishing, are effectively prevented.

Career Highlights

Ja-hyung Han is currently employed at Samsung Electronics Co., Ltd., where he continues to push the boundaries of innovation in his field. His work at Samsung has allowed him to collaborate with leading experts and contribute to cutting-edge technologies that are essential in the electronics industry.

Collaborations

Some of Han's notable coworkers include Byung-Lyul Park and Ju-Hyuk Chung. Their collaborative efforts have further enhanced the development of innovative solutions in the realm of chemical mechanical polishing.

Conclusion

Ja-hyung Han's contributions to the field of polishing technology are significant and impactful. His innovative patents and work at Samsung Electronics Co., Ltd. demonstrate his commitment to advancing engineering solutions. His inventions not only improve efficiency but also address critical challenges in the industry.

Profile summary based on public USPTO records.
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