Plainfield, IL, United States of America

J Scott Steckenrider


Average Co-Inventor Count = 2.4

ph-index = 4

Forward Citations = 58(Granted Patents)


Company Filing History:


Years Active: 2003-2007

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4 patents (USPTO):Explore Patents

Title: The Innovations of J Scott Steckenrider

Introduction

J Scott Steckenrider is a notable inventor based in Plainfield, IL (US). He has made significant contributions to the field of technology, particularly in the area of integrated circuits and polishing methods. With a total of 4 patents to his name, his work continues to influence advancements in various industries.

Latest Patents

Among his latest patents, Steckenrider has developed a method for continuous contour polishing of a multi-material surface. This invention involves a chemical-mechanical polishing pad and a method of polishing a substrate using a resilient subpad and a polymeric polishing film. The polishing film is designed to be substantially free of bound abrasive particles, enhancing the efficiency of the polishing process. Another significant patent is for a three-dimensional integrated circuit that reduces interconnect signal delay compared to traditional 2-dimensional systems. This innovative circuit design also allows for improved cooling, featuring two or more electrically connected integrated circuits separated by a cooling channel.

Career Highlights

Steckenrider is currently employed at Cabot Microelectronics Corporation, where he applies his expertise in developing cutting-edge technologies. His work has been instrumental in advancing the capabilities of integrated circuits and polishing techniques.

Collaborations

Throughout his career, Steckenrider has collaborated with talented individuals such as Heinz Hermann Busta and Ian Wylie. These partnerships have fostered innovation and contributed to the success of his projects.

Conclusion

J Scott Steckenrider's contributions to technology through his patents and collaborations highlight his role as a significant inventor in the field. His work continues to pave the way for future advancements in integrated circuits and polishing methods.

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