The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 18, 2003
Filed:
Jun. 26, 1998
Applicant:
Inventors:
J. Scott Steckenrider, Plainfield, IL (US);
Brian L. Mueller, Aurora, IL (US);
Assignee:
Cabot Microelectronics Corporation, Aurora, IL (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C09G 1/04 ;
U.S. Cl.
CPC ...
C09G 1/04 ;
Abstract
An aqueous chemical mechanical polishing slurry useful for polishing the polysilicon layer of a semiconductor wafer comprising an aqueous solution of at least one abrasive, and at least one alcoholamine. The slurry preferably has a pH of from about 9.0 to about 10.5 and it includes an optional buffering agent.
Steckenrider, J.. (2003). Chemical mechanical polishing slurry and method for using same (U.S. Patent No. 6533832). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6533832
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile