Location History:
- Boston, MA (US) (2001)
- Peabody, MA (US) (2003)
- West Roxbury, MA (US) (2000 - 2010)
Company Filing History:
Years Active: 2000-2010
Title: J David Casey, Jr: Innovator in Photolithography Mask Repair
Introduction
J David Casey, Jr. is a notable inventor based in West Roxbury, MA (US), recognized for his contributions to the field of photolithography mask repair. With a total of seven patents to his name, Casey has made significant advancements in the technology used for repairing photolithography masks, which are essential in the semiconductor manufacturing process.
Latest Patents
One of his latest patents involves electron beam processing for mask repair. This innovative method restores transmissivity to a gallium-stained substrate by directing an electron beam to the substrate in the presence of an etching gas. For higher concentrations of implanted gallium, the transparency can be substantially restored without reducing the thickness of the substrate. In cases of lower doses of implanted gallium, the transmission is restored to 100%, although the thickness of the substrate is reduced. This invention is particularly suitable for the repair of photolithography masks. Another significant patent focuses on photolithography mask repair itself. This method allows for the creation of a structure that differs from the original design but produces the same aerial image. For instance, missing opaque material can be replaced by implanting gallium atoms to reduce transmission, while quartz can be etched to an appropriate depth to achieve the desired phase. Additionally, a laser or other means can be employed to remove an area of a mask around a defect, enabling the construction of mask structures using charged particle beam deposition and etching.
Career Highlights
Throughout his career, J David Casey, Jr. has worked with prominent companies such as FEI Company and Micrion Corporation. His experience in these organizations has contributed to his expertise in the field of photolithography and mask repair technologies.
Collaborations
Casey has collaborated with notable individuals in his field, including Christian R Musil and Richard F Shuman. These collaborations have likely enhanced his innovative capabilities and contributed to the development of his patents.
Conclusion
J David Casey, Jr. stands out as a significant figure in the realm of photolithography mask repair, with his innovative patents paving the way for advancements in the semiconductor industry. His work continues to influence the field and showcases the importance of innovation in technology.