The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 01, 2010
Filed:
Jan. 16, 2004
Diane K. Stewart, Ipswich, MA (US);
J. David Casey, Jr., West Roxbury, MA (US);
Joan Williams Casey, Legal Representative, West Roxbury, MA (US);
John Beaty, Belmont, MA (US);
Christian R. Musil, New Providence, NJ (US);
Steven Berger, Portland, OR (US);
Sybren J. Sijbrandij, Arlington, MA (US);
Diane K. Stewart, Ipswich, MA (US);
J. David Casey, Jr., West Roxbury, MA (US);
Joan Williams Casey, legal representative, West Roxbury, MA (US);
John Beaty, Belmont, MA (US);
Christian R. Musil, New Providence, NJ (US);
Steven Berger, Portland, OR (US);
Sybren J. Sijbrandij, Arlington, MA (US);
FEI Company, Hillsboro, OR (US);
Abstract
Transmissivity is restored to a gallium stained substrate by directing an electron beam to the substrate in the presence of an etching gas. For higher concentrations of implanted gallium, the transparency can be substantially restored without reducing the thickness of the substrate. For lower doses of implanted gallium, the transmission is restored to 100%, although the thickness of the substrate is reduced. The invention is suitable for use in the repair of photolithography masks.