The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 28, 2000
Filed:
Apr. 16, 1997
J David Casey, Jr, West Roxbury, MA (US);
Andrew Doyle, Epping, NH (US);
Micrion Corporation, Peabody, MA (US);
Abstract
The present invention generally provides methods for employing a focused particle beam system in the removal of an excess portion from a workpiece having an opaque film patterned on a substrate and more particularly provides methods of gas-assisted etching using an etching gas including bromine. One aspect of the invention provides a method including the steps of (i) mounting the workpiece on a movable stage capable of movement in the X and Y directions, (ii) scanning a selected surface area of a workpiece, having an opaque film patterned on a substrate, with a focused particle beam, (iii) detecting intensities of particles emitted from the workpiece as a result of the workpiece scanning step, (iv) determining a shape of the patterned film based on the detected particle intensities, (v) determining an excess portion of the patterned film based on the shape of the patterned film, (vi) etching the excess portion with the focused particle beam, and (vii) introducing an etching gas, concurrent with the etching step, in selected proximity to the excess portion. The etching gas includes bromine or a bromine-containing material. The etching gas can further include water vapor.