The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 27, 2001
Filed:
Mar. 10, 2000
Applicant:
Inventors:
Richard F. Shuman, Concord, MA (US);
Kathryn Noll, Tewksbury, MA (US);
J. David Casey, Jr., Boston, MA (US);
Assignee:
FEI Company, Hillsboro, OR (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 1/434 ; C23F 1/00 ;
U.S. Cl.
CPC ...
C23C 1/434 ; C23F 1/00 ;
Abstract
A method of enhancing charged particle beam etching particularly suitable for copper interconnects, includes milling at non-contiguous locations to prevent the formation or propagation of an etch-resistant region within the rastered area. Two or more milling boxes are typically performed, one or more of the boxes having pixel spacing greater than the spot size, with the last box using a conventional pixel spacing (default mill) smaller than the spot size to produce a uniform, planar floor of the etched area.