Tewksbury, MA, United States of America

Kathryn Noll

This inventor holds 2 USPTO granted patents. Top assignee: Fei Comapny. Active years: 2001-2003.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kathryn Noll. Retrieved from https://idiyas.com/inventor/kathryn-noll

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 3.7

ph-index = 2

Forward Citations = 30(Granted Patents)


Company Filing History:


Years Active: 2001-2003

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2 patents (USPTO):Explore Patents

Title: Kathryn Noll: Innovator in Charged Particle Beam Technology

Introduction

Kathryn Noll is a prominent inventor based in Tewksbury, MA (US). She has made significant contributions to the field of charged particle beam technology, holding 2 patents that showcase her innovative approach to material removal processes.

Latest Patents

Her latest patents include an "Apparatus and method for reducing differential sputter rates." This invention focuses on a charged particle beam that uniformly removes material, particularly crystalline material, by compensating for or altering the crystal orientation or structure. This method is particularly suited for focused ion beam (FIB) micromachining of copper-based crystalline structures. The uniformity of material removal can be enhanced by passing incoming ions through a sacrificial layer formed on the surface of the material to be removed. The sacrificial layer is removed along with the material being milled. Additionally, uniformity can be improved by changing the morphology of the material, such as disrupting its crystal structure or altering its topography.

Another notable patent is the "Method and apparatus for milling copper interconnects in a charged particle beam system." This method enhances charged particle beam etching, particularly for copper interconnects, by milling at non-contiguous locations to prevent the formation of etch-resistant regions. The process typically involves performing two or more milling boxes, with varying pixel spacing to achieve a uniform, planar floor of the etched area.

Career Highlights

Kathryn Noll is currently employed at FEI Company, where she continues to develop innovative solutions in her field. Her work has significantly impacted the efficiency and effectiveness of charged particle beam applications.

Collaborations

Throughout her career, Kathryn has collaborated with notable colleagues, including Richard F. Shuman and J. David Casey, Jr. These collaborations have further enriched her contributions to the field.

Conclusion

Kathryn Noll's innovative work in charged particle beam technology exemplifies her commitment to advancing material removal processes. Her patents reflect her expertise and dedication to improving techniques in this specialized area.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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