Yamanashi, Japan

Issei Imahashi


Average Co-Inventor Count = 1.4

ph-index = 13

Forward Citations = 1,343(Granted Patents)


Location History:

  • Tokyo, JP (1989 - 1991)
  • Yamanashi, JP (1982 - 1995)
  • Yamanashi-ken, JP (1996 - 2002)

Company Filing History:


Years Active: 1982-2002

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22 patents (USPTO):Explore Patents

Title: Issei Imahashi: Innovator in Plasma Processing Technologies

Introduction

Issei Imahashi, based in Yamanashi, Japan, is a renowned inventor with an impressive portfolio of 22 patents. His groundbreaking work primarily focuses on plasma processing technologies, which have significant applications in various industries, including semiconductor manufacturing.

Latest Patents

Imahashi's latest patents showcase his innovative approach to overcoming challenges in plasma technology. One of his patents, titled "Method and Apparatus for Plasma Processing," introduces a novel solution to decrease reflected waves in a vacuum chamber. This invention enables better control of plasma density, allowing for uniform treatment of substrates. By employing an electromagnetic wave absorber made from materials like carbon, water, or ferrite-based ceramics, this technology enhances the efficiency and precision of plasma applications.

Another notable patent is the "Plasma Polishing Method." This invention details a plasma polishing apparatus with a high-speed rotating table that holds a wafer. By utilizing a plasma generator to convert process gas into plasma through high-frequency inductive coupling, Imahashi's apparatus ensures that the plasma uniformly polishes the wafer's target surface, resulting in improved surface quality.

Career Highlights

Throughout his career, Issei Imahashi has contributed to leading companies in the industry, such as Tokyo Electron Limited and Telmec Co., Ltd. His experience in these organizations has allowed him to refine his expertise in plasma processing technologies and significantly impact the field.

Collaborations

Imahashi has worked alongside esteemed colleagues, including Nobuo Ishii and Kiichi Hama, fostering a collaborative environment that has led to significant advancements in their research and development endeavors.

Conclusion

Issei Imahashi exemplifies the spirit of innovation with his substantial contributions to plasma processing technologies. His extensive patent portfolio not only reflects his dedication to invention but also highlights the importance of collaborative efforts in pushing the boundaries of technology. As industries continue to evolve, Imahashi's work remains at the forefront of advancing plasma applications, impacting sectors across the globe.

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