The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 13, 2002
Filed:
Sep. 12, 2000
Issei Imahashi, Yamanashi-Ken, JP;
Nobuo Ishii, Minoo, JP;
Satoru Kawakami, Sagamihara, JP;
Yoshinobu Kawai, Fukuoka, JP;
Yoko Ueda, Fukuoka, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
The present invention aims to decrease reflected waves in a vacuum chamber to suppress standing waves, thereby easily controlling a plasma density so that uniform treatment can be performed. An electromagnetic wave absorber composed of a resistor such as carbon, a dielectric having a large dielectric loss, such as water, or a magnetic material such as ferrite-based ceramic, or a combination of these, is provided on an inner wall surface of a first vacuum chamber . Microwaves introduced from a waveguide into the first vacuum chamber via a transmissive window are absorbed to the electromagnetic wave absorber to suppress reflected waves, whereby a plasma density distribution with a nearly planned pattern is easily formed at an ECR point.