Yoko Ueda

Title: **Yoko Ueda: Innovator in Plasma Measurement and Processing Technologies**

Introduction

Yoko Ueda, an accomplished inventor hailing from Fukuoka, Japan, has made significant strides in the field of plasma measurement and processing. With a total of three patents to her name, Ueda's contributions demonstrate her expertise and commitment to advancing technology in her research area.

Latest Patents

Ueda's latest patents showcase groundbreaking methodologies that enhance the understanding and manipulation of plasma. One notable invention, titled **"Method of Measuring Negative Ion Density of Plasma and Plasma Processing Method and Apparatus for Carrying Out the Same,"** involves an innovative approach to measuring saturation currents (I) when a probe contacts plasma produced by ionizing argon gas. This method determines the negative ion density of plasma produced by ionizing a mixed gas, leveraging saturation current ratios to provide accurate readings.

Another impressive patent, **"Method and Apparatus for Plasma Processing,"** aims to minimize reflected waves in a vacuum chamber, which is crucial for controlling plasma density. By incorporating electromagnetic wave absorbers made of materials such as carbon and ferrite-based ceramics into the chamber's inner walls, Ueda's invention facilitates uniform plasma treatment, enhancing the effectiveness of various plasma-related processes.

Career Highlights

Currently, Yoko Ueda is employed at Tokyo Electron Limited, where she continues to push the boundaries of innovation in semiconductor manufacturing and related technologies. Her work in developing advanced plasma techniques reflects her dedication to improving the efficiency and reliability of plasma processes integral to modern technology.

Collaborations

Throughout her career, Ueda has collaborated with esteemed colleagues such as Yoshinobu Kawai and Nobuo Ishii. These partnerships have fostered a cooperative environment for research and development, contributing to the breadth and depth of her patent portfolio.

Conclusion

Yoko Ueda stands out as a prominent figure in her field, with her inventive spirit and collaborative approach driving advancements in plasma measurement and processing. With her ongoing contributions, she continues to inspire future innovations that will shape the landscape of technology.