Tokyo, Japan

Iori Yoshida

USPTO Granted Patents = 11 

 

Average Co-Inventor Count = 3.0

ph-index = 2

Forward Citations = 13(Granted Patents)


Location History:

  • Yokohama, JP (2010 - 2011)
  • Chiyoda-ku, JP (2009 - 2016)
  • Tokyo, JP (2012 - 2018)

Company Filing History:


Years Active: 2009-2018

Loading Chart...
Loading Chart...
11 patents (USPTO):Explore Patents

Title: The Innovative Mind of Iori Yoshida

Introduction

Iori Yoshida, an esteemed inventor based in Tokyo, Japan, has significantly contributed to the field of materials science with his innovative patents. With a remarkable portfolio of 11 patents, Yoshida's work primarily revolves around advanced semiconductor materials, particularly single-crystal silicon carbide substrates.

Latest Patents

Among his latest innovations is a patent for a single-crystal silicon-carbide substrate and polishing solution. This invention focuses on a substrate characterized by an atomic step-and-terrace structure that enhances the material's properties for semiconductor applications. The atomic step-and-terrace structure shows a proportion of average line roughness to atomic step height of 20% or less, aiding in the development of higher-quality silicon carbide substrates.

Additionally, Yoshida has developed a process for manufacturing these substrates, which involves polishing a single-crystal silicon-carbide plate using a specially designed polishing pad and solution. His innovative approach eliminates abrasives from the polishing process, utilizing a non-woven fabric or porous resin in conjunction with an oxidizing polishing solution containing transition metals to achieve optimal surface quality.

Career Highlights

Yoshida has had an impressive career trajectory, working with notable companies such as Asahi Glass Company, Limited and AGC Seimi Chemical Co., Ltd. His experience in these esteemed firms has allowed him to hone his skills in material development and innovation, facilitating advances in semiconductor technology.

Collaborations

Throughout his career, Iori Yoshida has collaborated with distinguished colleagues, including Yoshinori Kon and Satoshi Takemiya. These collaborations have been instrumental in driving forward innovative research and development projects in the semiconductor sector, establishing a network of expertise that enhances the impact of their work.

Conclusion

Iori Yoshida stands out as a prominent figure in the field of semiconductor materials. His 11 patents reflect his commitment to innovation and his ability to solve complex engineering challenges. As technology continues to advance, Yoshida's contributions are likely to play a pivotal role in shaping the future of materials science and semiconductor manufacturing.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…