The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 28, 2010
Filed:
Apr. 25, 2007
Katsuaki Miyatani, Chiyoda-ku, JP;
Osamu Miyahara, Chiyoda-ku, JP;
Yuzuru Tanabe, Chiyoda-ku, JP;
Hiroshi Usui, Chiyoda-ku, JP;
Yoshihisa Beppu, Chiyoda-ku, JP;
Kazuo Sunahara, Chiyoda-ku, JP;
Mitsuru Horie, Chiyoda-ku, JP;
Satoshi Kashiwabara, Chiyoda-ku, JP;
Tomohiro Sakai, Chiyoda-ku, JP;
Yoshinori Kon, Chiyoda-ku, JP;
Iori Yoshida, Chiyoda-ku, JP;
Katsuaki Miyatani, Chiyoda-ku, JP;
Osamu Miyahara, Chiyoda-ku, JP;
Yuzuru Tanabe, Chiyoda-ku, JP;
Hiroshi Usui, Chiyoda-ku, JP;
Yoshihisa Beppu, Chiyoda-ku, JP;
Kazuo Sunahara, Chiyoda-ku, JP;
Mitsuru Horie, Chiyoda-ku, JP;
Satoshi Kashiwabara, Chiyoda-ku, JP;
Tomohiro Sakai, Chiyoda-ku, JP;
Yoshinori Kon, Chiyoda-ku, JP;
Iori Yoshida, Chiyoda-ku, JP;
Asahi Glass Company, Limited, Tokyo, JP;
Abstract
A method for producing a glass substrate for a magnetic disk by polishing a circular glass plate, which comprises a step of polishing the principal plane of the circular glass plate by using a slurry containing a CeOcrystal powder, the CeOcrystal powder being obtained in such a manner that a melt containing CeOis quenched to obtain an amorphous material, and the amorphous material is subjected to heat treatment to obtain a CeOcrystals-precipitated amorphous material, which is subjected to acid treatment to separate and extract the CeOcrystal powder from the CeOcrystals-precipitated amorphous material.