Company Filing History:
Years Active: 2023-2025
Title: Ilanit Fisher: Innovator in Atomic Layer Deposition Technologies
Introduction
Ilanit Fisher is a prominent inventor based in San Jose, California, known for her contributions to the field of atomic layer deposition (ALD) technologies. With a total of four patents to her name, she has made significant advancements in the methods and systems used in semiconductor manufacturing.
Latest Patents
One of her latest patents is titled "Systems and methods for homogenous intermixing of precursors in alloy atomic layer deposition." This invention features a showerhead design that includes multiple plenums and through holes, allowing for the precise delivery of metal precursors and reactants without intermixing. The design ensures that the plenums are stacked in a specific order, optimizing the deposition process on semiconductor substrates.
Another notable patent is the "Method of reducing titanium nitride etching during tungsten film formation." This patent outlines methods for forming electronic devices that utilize tungsten film stacks. The process involves creating a tungsten nucleation layer using an ALD process that is free of fluorine, thereby enhancing the quality and performance of the resulting films.
Career Highlights
Ilanit Fisher has worked with leading companies in the semiconductor industry, including Applied Materials, Inc. and Lam Research Corporation. Her experience in these organizations has allowed her to develop innovative solutions that address complex challenges in semiconductor manufacturing.
Collaborations
Throughout her career, Ilanit has collaborated with talented individuals such as Kedi Wu and Chenfei Shen. These partnerships have contributed to her success and the advancement of technologies in her field.
Conclusion
Ilanit Fisher's work in atomic layer deposition technologies showcases her innovative spirit and dedication to advancing semiconductor manufacturing processes. Her patents reflect her expertise and commitment to improving the efficiency and effectiveness of electronic device fabrication.
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