Company Filing History:

10 out of 377

Japan Synthetic Rubber Co., Ltd.

Years Active: 1982-2001

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14 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 6270939 - Radiation-sensitive resin composition (2001-08-07),

2. 6228554 - Radiation-sensitive resin composition (2001-05-08),

3. 6020104 - Radiation-sensitive resin composition utilizing monooxymonocarboxylic (2000-02-01),

4. 5925492 - Radiation-sensitive resin composition utilizing monooxymonocarboxylic (1999-07-20),

5. 5753406 - Radiation-sensitive resin composition (1998-05-19),

6. 5494784 - Method of pattern formation utilizing radiation-sensitive resin (1996-02-27),

7. 5478691 - Radiation-sensitive resin composition (1995-12-26),

8. 5405720 - Radiation-sensitive composition containing 1,2 quinonediazide compound, (1995-04-11),

9. 5238774 - Radiation-sensitive composition containing 1,2-quinonediazide compound, (1993-08-24),

10. 5215857 - 1,2-quinonediazide containing radiation-sensitive resin composition (1993-06-01),

11. 5087548 - Positive type radiation-sensitive resin composition (1992-02-11),

12. 4626556 - Solvent-soluble organopolysilsesquioxane, process for producing the (1986-12-02),

13. 4399266 - Laddery lower alkylpolysilsesquioxane having heat-resistant thin (1983-08-16),

14. 4349664 - Doped acetylene polymer and process for production thereof (1982-09-14),

Title: Ikuo Nozue: Innovator in Radiation-Sensitive Resin Compositions

Introduction

Ikuo Nozue is a prominent inventor based in Yokkaichi, Japan. He has made significant contributions to the field of radiation-sensitive resin compositions, holding a total of 14 patents. His work has been instrumental in advancing technologies used in integrated circuits.

Latest Patents

Nozue's latest patents focus on radiation-sensitive resin compositions. One of his notable inventions is a radiation-sensitive resin composition that comprises a solution of an alkali-soluble resin and a radiation-sensitive compound in a solvent made from a monooxymonocarboxylic acid ester. This composition is recognized for its high storage stability, as it forms a very small amount of fine particles during storage, making it particularly suitable for use as a resist in integrated circuit manufacturing.

Career Highlights

Throughout his career, Ikuo Nozue has worked with reputable companies, including Japan Synthetic Rubber Co., Ltd. and JSR Corporation. His expertise in the field has led to numerous innovations that have had a lasting impact on the industry.

Collaborations

Nozue has collaborated with several notable individuals in his field, including Yoshihiro Hosaka and Masashige Takatori. These collaborations have further enriched his work and contributed to the development of advanced materials.

Conclusion

Ikuo Nozue's contributions to radiation-sensitive resin compositions have established him as a key figure in the field of integrated circuit technology. His innovative patents and collaborations continue to influence advancements in this area.

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