Clayfield, Australia

Idriss Blakey

USPTO Granted Patents = 4 

Average Co-Inventor Count = 4.7

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 2017-2018

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4 patents (USPTO):Explore Patents

Title: The Innovative Contributions of Idriss Blakey

Introduction

Idriss Blakey is a notable inventor based in Clayfield, Australia. He has made significant contributions to the field of materials science, particularly in the development of advanced copolymers and their applications in electronic devices. With a total of 4 patents to his name, Blakey's work has had a profound impact on the industry.

Latest Patents

Blakey's latest patents include innovative technologies that enhance the performance of electronic devices. One of his notable inventions is a copolymer and associated layered article, which is prepared by the polymerization of monomers that include an ultraviolet absorbing monomer and a base-solubility-enhancing monomer. This copolymer is particularly useful for forming a topcoat layer for electron beam and extreme ultraviolet lithographies. Additionally, he has developed a block copolymer and associated photoresist composition that is effective in electron beam and extreme ultraviolet photolithography. This block copolymer includes a first block with units derived from a base-solubility-enhancing monomer and an out-of-band absorbing monomer, and a second block having a low surface energy.

Career Highlights

Throughout his career, Idriss Blakey has worked with prestigious organizations, including the University of Queensland and Rohm & Haas Electronic Materials LLC. His work has been instrumental in advancing the field of photolithography and enhancing the capabilities of electronic devices.

Collaborations

Blakey has collaborated with several professionals in his field, including Andrew Keith Whittaker and James W. Thackeray. These collaborations have contributed to the successful development of his innovative technologies.

Conclusion

Idriss Blakey's contributions to the field of materials science and electronic devices are noteworthy. His innovative patents and collaborations have paved the way for advancements in photolithography and electronic device manufacturing. His work continues to influence the industry and inspire future innovations.

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