The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 01, 2018

Filed:

Aug. 07, 2015
Applicants:

The University of Queensland, St. Lucia, AU;

Rohm and Haas Electronic Materials Llc, Marlborough, MA (US);

Inventors:

James W. Thackeray, Braintree, MA (US);

Ke Du, Queensland, AU;

Peter Trefonas, III, Medway, MA (US);

Idriss Blakey, Clayfield, AU;

Andrew Keith Whittaker, Toowong, AU;

Assignees:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08F 220/28 (2006.01); B05D 1/00 (2006.01); G03F 7/20 (2006.01); G03F 7/09 (2006.01);
U.S. Cl.
CPC ...
C08F 220/28 (2013.01); B05D 1/005 (2013.01); G03F 7/094 (2013.01); G03F 7/20 (2013.01); C08F 2220/281 (2013.01); C08F 2438/03 (2013.01);
Abstract

A copolymer is prepared by the polymerization of monomers that include an ultraviolet absorbing monomer, and a base-solubility-enhancing monomer. The copolymer is useful for forming a topcoat layer for electron beam and extreme ultraviolet lithographies. Also described are a layered article including the topcoat layer, and an associated method of forming an electronic device.


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