Hyung Wook Noh

Title: Innovations of Hyung Wook Noh

Introduction

Hyung Wook Noh is a notable inventor based in Anyang-si, South Korea. He has made significant contributions to the field of thin film technology, holding a total of 3 patents. His work primarily focuses on methods of forming and depositing thin films using advanced techniques.

Latest Patents

One of his latest patents is a method of forming a thin film. This method utilizes atomic layer deposition (ALD) to achieve a target thickness on a substrate. It involves multiple processing conditions, each with a distinct film growth rate. The method ensures precise and uniform control over the thickness of the thin film during the ALD process. Another significant patent is a method of depositing a thin film, which includes the use of polymer precursors at controlled temperatures. This approach enhances the uniformity and step coverage of the thin film, further advancing the capabilities of ALD technology.

Career Highlights

Hyung Wook Noh is currently employed at ASM IP Holding B.V., where he continues to innovate in the field of thin film deposition. His expertise in atomic layer deposition has positioned him as a key player in the development of advanced materials.

Collaborations

He has collaborated with notable colleagues, including Seung Woo Choi and Dae Youn Kim, contributing to various projects that enhance the understanding and application of thin film technologies.

Conclusion

Hyung Wook Noh's contributions to thin film technology through his patents and collaborations highlight his role as an influential inventor in the field. His innovative methods continue to push the boundaries of material science and engineering.