Hung-Yin Lin

Title: Innovations of Inventor Hung-Yin Lin

Introduction

Hung-Yin Lin is a prominent inventor based in Taichung, Taiwan. He has made significant contributions to the field of semiconductor technology. With a total of 3 patents to his name, Lin's work focuses on advanced processes that enhance semiconductor fabrication.

Latest Patents

One of Lin's latest patents is an "Advanced process control method for controlling width of spacer and dummy sidewall in semiconductor device." This innovative method involves providing a semiconductor substrate and a target width for a gate. It includes forming the gate on the substrate, depositing a dielectric layer, and determining a trim time for the dielectric layer to create the spacer.

Another notable patent is the "Method for controlling processing temperature in semiconductor fabrication." This method detects temperature in a processing chamber and creates a flow of heat-exchange medium to cool the chamber. It allows for precise control of the temperature during semiconductor wafer processing.

Career Highlights

Hung-Yin Lin is currently employed at Taiwan Semiconductor Manufacturing Company Limited. His work at this leading semiconductor manufacturer has positioned him as a key player in the industry. Lin's innovative approaches have contributed to advancements in semiconductor technology.

Collaborations

Lin has collaborated with notable colleagues, including Hsien-Chieh Tsai and Tz-Wei Lin. Their teamwork has fostered an environment of innovation and excellence in semiconductor research and development.

Conclusion

Hung-Yin Lin's contributions to semiconductor technology through his patents and collaborations highlight his role as a significant inventor in the field. His innovative methods continue to influence the industry and pave the way for future advancements.