Hung-Wen Chang

Title: Innovations by Inventor Hung-Wen Chang

Introduction

Hung-Wen Chang is a notable inventor based in Hsin-Chu, Taiwan. He has made significant contributions to the field of semiconductor processing, holding a total of 3 patents. His work focuses on improving methods for particle reduction and defect detection in memory devices.

Latest Patents

One of Hung-Wen Chang's latest patents is titled "Methods for particle reduction in semiconductor processing." This patent describes a method that includes providing a semiconductor wafer, attaching a polyimide layer to the backside of the wafer, and performing an etch on the active surface. The polyimide layer captures particles that may impinge on the backside during the etching process. Another method involves attaching a layer of polyimide film to the backside of a semiconductor wafer, dry etching a material on the active surface, and patterning the layer of material using an immersion photolithography process.

Another significant patent is the "Device for detecting defective global word line." This invention includes a first and second global word line, a global word-line front end, and a voltage-controlled transistor. The device is designed to detect defects in memory by outputting a test current based on the conditions of the global word lines.

Career Highlights

Hung-Wen Chang has worked with prominent companies in the semiconductor industry, including Taiwan Semiconductor Manufacturing Company Ltd. and Integrated Circuit Solution Inc. His experience in these organizations has contributed to his expertise in semiconductor technologies and innovations.

Collaborations

Throughout his career, Hung-Wen Chang has collaborated with talented individuals such as Shao-Yu Chou and Yue-Der Chih. These collaborations have likely enhanced his research and development efforts in the semiconductor field.

Conclusion

Hung-Wen Chang is a distinguished inventor whose work in semiconductor processing has led to valuable patents that address critical challenges in the industry. His contributions continue to influence advancements in technology and innovation.