Company Filing History:
Years Active: 2017-2025
Title: Innovations by Inventor Hung-Tsung Huang
Introduction
Hung-Tsung Huang is a notable inventor based in Tainan, Taiwan. He has made significant contributions to the field of chemical-mechanical polishing compositions, holding a total of 3 patents. His work focuses on enhancing the efficiency and selectivity of polishing processes used in semiconductor manufacturing.
Latest Patents
One of his latest patents is titled "Nitride inhibitors for high selectivity of TiN—SiN CMP applications." This invention provides a chemical-mechanical polishing composition that includes abrasive particles and a removal rate inhibitor. The composition is designed to improve the polishing process for substrates comprising titanium nitride (TiN) and silicon nitride (SiN). Another significant patent is "Surface treated abrasive particles for tungsten buff applications." This invention offers a polishing composition that includes a surface-coated abrasive and an oxidizing agent, specifically tailored for substrates made of tungsten or cobalt and silicon oxide.
Career Highlights
Hung-Tsung Huang has worked with prominent companies in the semiconductor industry, including CMC Materials, Inc. and Cabot Microelectronics Corporation. His experience in these organizations has contributed to his expertise in developing innovative polishing solutions.
Collaborations
He has collaborated with notable colleagues such as Chih-Hsien Chien and Ming-Chih Yeh, further enhancing his contributions to the field.
Conclusion
Hung-Tsung Huang's innovative work in chemical-mechanical polishing compositions has made a significant impact on the semiconductor industry. His patents reflect a commitment to advancing technology and improving manufacturing processes.