Hung-Chih Hsieh

Title: Innovations of Hung-Chih Hsieh

Introduction

Hung-Chih Hsieh is a prominent inventor based in Miaoli County, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 11 patents. His work primarily focuses on methodologies for overlay measurement, which are crucial for the precision of semiconductor manufacturing.

Latest Patents

One of his latest patents is titled "Frequency-picked methodology for diffraction-based overlay measurement." This innovative method involves disposing a lower-layer pattern over a substrate, which includes a first pattern with a plurality of sub-patterns extending in a specific direction. The method also incorporates a second pattern with smaller sub-patterns interleaved between the first sub-patterns. An upper-layer pattern is then disposed over the lower-layer pattern to determine the overlay error between the two layers. This technique enhances the accuracy of overlay measurements, which is vital for the production of high-quality semiconductor devices.

Career Highlights

Hung-Chih Hsieh is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His expertise in overlay measurement methodologies has positioned him as a key figure in advancing semiconductor manufacturing processes.

Collaborations

He has collaborated with notable colleagues, including Yen-Liang Chen and Kai-Hsiung Chen, contributing to various projects that enhance the efficiency and accuracy of semiconductor production.

Conclusion

Hung-Chih Hsieh's innovative work in overlay measurement methodologies has significantly impacted the semiconductor industry. His contributions continue to drive advancements in technology, ensuring the production of high-quality semiconductor devices.