The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 06, 2021
Filed:
Oct. 18, 2019
Taiwan Semiconductor Manufacturing Company, Ltd., Hsinchu, TW;
Hung-Chih Hsieh, Miaoli County, TW;
Chun-Liang Lung, Hsinchu, TW;
Taiwan Semiconductor Manufacturing Company, Ltd., Hsinchu, TW;
Abstract
An overlay metrology tool and diffraction-based overlay measurements are described herein. The tool includes a light source for generating an incident light that illuminates stacked overlay targets formed within material layers of a wafer and a light sensing system for measuring characteristics of a diffracted light beam reflected from the surface of the wafer. During a single illumination of the wafer and without rotating a polarization of the incident light beam, the light sensing system generates three components of the diffracted light beam having one or more polarizations and intensities, according to an overlay recipe associated with the stacked overlay targets.