Hui-Chi Lin

Title: Innovations by Hui-Chi Lin

Introduction

Hui-Chi Lin is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 2 patents. His work focuses on improving semiconductor processing methods and enhancing the performance of materials used in these processes.

Latest Patents

Hui-Chi Lin's latest patents include a "Semiconductor chamber process apparatus and method." This invention discloses a semiconductor processing apparatus that consists of multiple process chambers, where at least one semiconductor processing operation occurs within each chamber. The apparatus features a robot mechanism designed to rotate each process chamber upon the completion of its associated semiconductor processing operation. This mechanism may include several robots, specifically six robots configured on an associated carousel.

Another notable patent is the "Method to improve adhesion of molding compound by providing an oxygen-rich film over the top surface of a passivation layer." This method treats the surface of a passivation layer, which may comprise silicon dioxide or silicon nitride. An oxygen-rich layer is created over the surface of the passivation layer, enhancing its properties. The invention includes two embodiments, both involving the deposition of silicon oxide and silicon nitride layers, followed by oxidation treatments to improve adhesion.

Career Highlights

Hui-Chi Lin is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work at this company has allowed him to contribute to cutting-edge technologies and innovations in semiconductor processing.

Collaborations

Hui-Chi Lin has collaborated with notable coworkers, including Yi-Lung Cheng and Szu-An Wu. These collaborations have further enriched his research and development efforts in the semiconductor field.

Conclusion

Hui-Chi Lin's contributions to semiconductor technology through his innovative patents demonstrate his expertise and commitment to advancing the industry. His work continues to influence the development of more efficient semiconductor processing methods.