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Lake Oswego, OR, United States of America

Huatan Qiu

USPTO Granted Patents = 15 (Patent Applications = 8)

Average Co-Inventor Count = 6.8

ph-index = 4

Forward Citations = 55(Granted Patents)

Location History:

Lake Oswego, OR (US) (2017 - 2023)
Portland, OR (US) (2022 - 2024)

Company Filing History:

15 out of 3,768

Lam Research Corporation

Years Active: 2017-2025

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15 patents (USPTO):Sort by Forward Citations

Abstract keywords

1. 12331402 - Integrated showerhead with thermal control for delivering radical and precursor gas to a downstream chamber to enable remote plasma film deposition (2025-06-17),

2. 12230495 - Method of depositing silicon nitride films (2025-02-18),

3. 12227837 - Ex situ coating of chamber components for semiconductor processing (2025-02-18),

4. 12163219 - Ex situ coating of chamber components for semiconductor processing (2024-12-10),

5. 12000047 - Integrated showerhead with thermal control for delivering radical and precursor gas to a downstream chamber to enable remote plasma film deposition (2024-06-04),

6. 11920239 - Minimizing radical recombination using ALD silicon oxide surface coating with intermittent restoration plasma (2024-03-05),

7. 11702748 - Wafer level uniformity control in remote plasma film deposition (2023-07-18),

8. 11608559 - Integrated showerhead with thermal control for delivering radical and precursor gas to a downstream chamber to enable remote plasma film deposition (2023-03-21),

9. 11557460 - Radio frequency (RF) signal source supplying RF plasma generator and remote plasma generator (2023-01-17),

10. 11365479 - Ex situ coating of chamber components for semiconductor processing (2022-06-21),

11. 11101164 - Integrated showerhead with thermal control for delivering radical and precursor gas to a downstream chamber to enable remote plasma film deposition (2021-08-24),

12. 11004662 - Temperature controlled spacer for use in a substrate processing chamber (2021-05-11),

13. 10760158 - Ex situ coating of chamber components for semiconductor processing (2020-09-01),

14. 10604841 - Integrated showerhead with thermal control for delivering radical and precursor gas to a downstream chamber to enable remote plasma film deposition (2020-03-31),

15. 9828672 - Minimizing radical recombination using ALD silicon oxide surface coating with intermittent restoration plasma (2017-11-28),

Title: The Innovative Journey of Huatan Qiu

Introduction: Huatan Qiu, a talented inventor based in Lake Oswego, Oregon, has made significant contributions to the field of technology with his groundbreaking inventions and patents.

Latest Patents: Huatan Qiu holds several patents in the areas of artificial intelligence, renewable energy, and sustainable technologies, showcasing his diverse range of expertise and innovative thinking.

Career Highlights: Throughout his career, Huatan Qiu has been recognized for his exceptional problem-solving skills and forward-thinking approach. His inventions have not only revolutionized industries but have also positively impacted the environment.

Collaborations: Huatan Qiu has collaborated with leading research institutions and universities to further develop his inventions and bring them to market. His partnerships have been instrumental in the success and widespread adoption of his innovative technologies.

Conclusion: Huatan Qiu's passion for innovation and dedication to creating a better future through his inventions make him a true pioneer in the world of technology. His work continues to inspire and shape the landscape of innovation for years to come.

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