The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 21, 2023
Filed:
Aug. 12, 2021
Lam Research Corporation, Fremont, CA (US);
Rachel Batzer, Tualatin, OR (US);
Huatan Qiu, Lake Oswego, OR (US);
Bhadri Varadarajan, Beaverton, OR (US);
Patrick Girard Breiling, Portland, OR (US);
Bo Gong, Sherwood, OR (US);
Will Schlosser, Portland, OR (US);
Zhe Gui, Beaverton, OR (US);
Taide Tan, Tigard, OR (US);
Geoffrey Hohn, Portland, OR (US);
Lam Research Corporation, Fremont, CA (US);
Abstract
A substrate processing system includes a first chamber including a substrate support. A showerhead is arranged above the first chamber and is configured to filter ions and deliver radicals from a plasma source to the first chamber. The showerhead includes a heat transfer fluid plenum, a secondary gas plenum including an inlet to receive secondary gas and a plurality of secondary gas injectors to inject the secondary gas into the first chamber, and a plurality of through holes passing through the showerhead. The through holes are not in fluid communication with the heat transfer fluid plenum or the secondary gas plenum.