Tigard, OR, United States of America

Taide Tan

USPTO Granted Patents = 7 

Average Co-Inventor Count = 5.0

ph-index = 3

Forward Citations = 15(Granted Patents)


Company Filing History:


Years Active: 2020-2025

Loading Chart...
7 patents (USPTO):

Title: Taide Tan: Innovator in Substrate Processing Technology

Introduction

Taide Tan is a prominent inventor based in Tigard, OR (US), known for his contributions to substrate processing technology. He holds a total of 7 patents, showcasing his innovative approach to engineering solutions in the field.

Latest Patents

One of Taide Tan's latest patents is an integrated showerhead with thermal control designed for delivering radical and precursor gas to a downstream chamber. This invention enables remote plasma film deposition. The substrate processing system includes a first chamber with a substrate support. A showerhead is positioned above the first chamber, configured to filter ions and deliver radicals from a plasma source. The showerhead features a heat transfer fluid plenum, a secondary gas plenum with an inlet for secondary gas, and multiple secondary gas injectors to introduce the secondary gas into the first chamber. Additionally, it contains several through holes that do not communicate with the heat transfer fluid plenum or the secondary gas plenum.

Career Highlights

Taide Tan is currently employed at Lam Research Corporation, where he continues to develop innovative technologies that enhance substrate processing. His work has significantly impacted the efficiency and effectiveness of plasma deposition processes.

Collaborations

Throughout his career, Taide has collaborated with notable colleagues, including Huatan Qiu and Rachel E Batzer, who contribute to the innovative environment at Lam Research Corporation.

Conclusion

Taide Tan's work exemplifies the spirit of innovation in substrate processing technology. His patents and collaborations reflect a commitment to advancing engineering solutions in the industry.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…