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For the Inventor, By the Inventor

Portland, OR, United States of America

Geoffrey Hohn

This inventor holds 12 USPTO granted patents and 5 published patent applications. Top assignee: Lam Research Corporation. Active years: 2017-2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Geoffrey Hohn. Retrieved from https://idiyas.com/inventor/geoffrey-hohn

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 12 

% Patents Active = 100.0

Average Co-Inventor Count = 9.1

ph-index = 4

Forward Citations = 55(Granted Patents)


Company Filing History:

goldMedal12 out of 3,955 
 
Lam Research Corporation
 patents

Years Active: 2017-2025

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12 patents (USPTO):Explore Patents
1. 12331402 - Integrated showerhead with thermal control for delivering radical and precursor gas to a downstream chamber to enable remote plasma film deposition (2025-06-17),
2. 12227837 - Ex situ coating of chamber components for semiconductor processing (2025-02-18),
3. 12163219 - Ex situ coating of chamber components for semiconductor processing (2024-12-10),
4. 12000047 - Integrated showerhead with thermal control for delivering radical and precursor gas to a downstream chamber to enable remote plasma film deposition (2024-06-04),
5. 11920239 - Minimizing radical recombination using ALD silicon oxide surface coating with intermittent restoration plasma (2024-03-05),
6. 11702748 - Wafer level uniformity control in remote plasma film deposition (2023-07-18),
7. 11608559 - Integrated showerhead with thermal control for delivering radical and precursor gas to a downstream chamber to enable remote plasma film deposition (2023-03-21),
8. 11365479 - Ex situ coating of chamber components for semiconductor processing (2022-06-21),
9. 11101164 - Integrated showerhead with thermal control for delivering radical and precursor gas to a downstream chamber to enable remote plasma film deposition (2021-08-24),
10. 10760158 - Ex situ coating of chamber components for semiconductor processing (2020-09-01),
11. 10604841 - Integrated showerhead with thermal control for delivering radical and precursor gas to a downstream chamber to enable remote plasma film deposition (2020-03-31),
12. 9828672 - Minimizing radical recombination using ALD silicon oxide surface coating with intermittent restoration plasma (2017-11-28),

Title: The Innovative Journey of Geoffrey Hohn

Introduction: Geoffrey Hohn, a talented inventor based in Portland, Oregon, has made significant contributions to the field of technology through his creative and groundbreaking ideas.

Latest Patents: Geoffrey Hohn holds several patents in various technological domains, showcasing his versatility and ingenuity in inventing new solutions to complex problems.

Career Highlights: With a career spanning over two decades, Geoffrey Hohn has worked tirelessly to bring his innovative concepts to life, revolutionizing industries and pushing the boundaries of what is possible.

Collaborations: Throughout his career, Geoffrey Hohn has collaborated with leading tech companies, research institutions, and universities to further develop and refine his inventions, demonstrating his commitment to excellence and advancement in the field.

Conclusion: Geoffrey Hohn's passion for innovation and his relentless pursuit of excellence have solidified his reputation as a visionary inventor, leaving a lasting impact on the world of technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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