This inventor holds 5 USPTO granted patents and 7 published patent applications. Top assignees: Silergy Semiconductor Technology (Hangzhou) Ltd, Advanced New Technologies Co., Ltd.. Active years: 2021-2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:

Years Active: 2021-2026
Title: Huan Wang: Innovator in Semiconductor Technology
Introduction
Huan Wang is a prominent inventor based in Hangzhou, China. He has made significant contributions to the field of semiconductor technology, holding 5 patents that showcase his innovative approach to enhancing system performance and cleaning processes in semiconductor devices.
Latest Patents
Huan Wang's latest patents include a method for enhancing the performance of inter-system service operations. This invention involves receiving a service request from a source system and sending it to a target system to facilitate user account login. The process includes storing a mapping relationship between the source and target systems to streamline subsequent service requests.
Another notable patent is a method for cleaning contact holes in semiconductor devices. This method outlines a two-step cleaning process, utilizing both dry and wet cleaning techniques to ensure the effective removal of materials from contact holes. The process also includes the formation of an interlayer dielectric layer and the filling of the contact hole with a metal material to create a metal plug.
Career Highlights
Huan Wang has worked with several notable companies in the semiconductor industry. He has been associated with Advanced New Technologies Co., Ltd. and Silergy Semiconductor Technology (Hangzhou) Ltd. His experience in these organizations has contributed to his expertise and innovative capabilities in semiconductor technology.
Collaborations
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Conclusion
Huan Wang is a distinguished inventor whose work in semiconductor technology has led to valuable patents that enhance system performance and cleaning processes. His contributions continue to impact the industry positively.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile