The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 20, 2021
Filed:
Jun. 04, 2019
Silergy Semiconductor Technology (Hangzhou) Ltd, Hangzhou, CN;
Huan Wang, Hangzhou, CN;
Silergy Semiconductor Technology (Hangzhou) LTD, Hangzhou, CN;
Abstract
A method of cleaning a contact hole of a semiconductor device, can include: removing a first portion of an object to be removed in the contact hole by a dry cleaning process, where a second portion of the object to be removed remains after the dry cleaning process has completed; and removing the second portion of the object to be removed by a wet cleaning process. The method can further include: forming an interlayer dielectric layer on a semiconductor substrate having a contact region; etching the interlayer dielectric layer to form the contact hole, where the contact hole penetrates the interlayer dielectric layer and exposes the contact region; and after the cleaning of the contact hole, filling the contact hole by a metal material to form a metal plug that is in contact with the contact region.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile