Hua Dong

Title: The Innovative Contributions of Hua Dong

Introduction

Hua Dong is a prominent inventor based in Shrewsbury, MA, known for her significant contributions to the field of semiconductor technology. With a total of four patents to her name, she has made remarkable advancements that have impacted various industries.

Latest Patents

Hua Dong's latest patents include innovative methods for enhancing semiconductor processes. One of her notable inventions is the "Inkjet Printable Etch Resist," which involves selectively depositing a resist containing a solid hydrogenated rosin resin and a liquid hydrogenated rosin resin ester mixture on a semiconductor. This method allows for the etching of uncoated portions of the semiconductor while simultaneously inhibiting undercutting of the resist. The etched portions can then be metallized to form current tracks. Another significant patent is "Inhibiting Background Plating," which includes methods for selectively depositing a phase change resist with high light transmittance onto a dielectric to create a pattern. This process involves etching away portions of the dielectric not covered by the resist and depositing a metal seed layer on the etched portions, followed by light-induced plating to form a metal layer.

Career Highlights

Throughout her career, Hua Dong has worked with notable companies such as Rohm & Haas Electronic Materials LLC and Sun Chemical Corporation. Her work in these organizations has allowed her to develop and refine her innovative techniques in semiconductor technology.

Collaborations

Hua has collaborated with esteemed colleagues, including Robert K. Barr and Thomas Charles Sutter, contributing to a dynamic exchange of ideas and advancements in their field.

Conclusion

Hua Dong's contributions to semiconductor technology through her patents and collaborations highlight her role as a leading inventor. Her innovative methods continue to influence the industry and pave the way for future advancements.