The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 25, 2013

Filed:

May. 18, 2011
Applicants:

Robert K. Barr, Shrewsbury, MA (US);

Hua Dong, Shrewsbury, MA (US);

Inventors:

Robert K. Barr, Shrewsbury, MA (US);

Hua Dong, Shrewsbury, MA (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01I 21/361 (2006.01);
U.S. Cl.
CPC ...
Abstract

Methods of making current tracks for semiconductors are disclosed. The methods involve selectively depositing a hot melt ink resist containing rosin resins and waxes on a silicon dioxide or silicon nitride layer coating a semiconductor followed by etching uncoated portions of the silicon dioxide or silicon nitride layer with an inorganic acid etch to expose the semiconductor and simultaneously inhibit undercutting of the hot melt ink resist. The etched portions may then be metallized to form a plurality of substantially uniform current tracks.


Find Patent Forward Citations

Barr, Robert. (2013). Method of forming current tracks on semiconductors (U.S. Patent No. 8470717). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8470717

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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