Hsiu-Chun Lee

Title: Hsiu-Chun Lee: Innovator in Semiconductor Technology

Introduction

Hsiu-Chun Lee is a prominent inventor based in Taipei, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 5 patents. His innovative approaches have paved the way for advancements in manufacturing processes and device performance.

Latest Patents

One of Hsiu-Chun Lee's latest patents is a method of manufacturing a PMOS transistor comprising a dual work function metal gate. This invention provides a comprehensive method for fabricating a semiconductor device, which includes forming a dummy gate on a substrate, creating an inter-layer dielectric layer (ILD) on the dummy gate and substrate, and forming a metal layer on the upper surface of the dummy gate. The process continues with the removal of the dummy gate to create a trench in the ILD, followed by the conformal formation of a gate dielectric layer in the trench. Additionally, a first conductive type metal layer is formed on the gate dielectric layer, which is then anisotropically etched to create a gap in the ILD, ultimately filling it with a second conductive type metal layer.

Another notable patent is a method of reducing the microloading effect. This invention utilizes a photoresist layer as a buffer to mitigate the microloading effect during the etching process. The method involves providing a substrate defined with a dense region and an isolated region, forming dense and isolated feature patterns on these regions, and covering the isolated region with a photoresist layer. The substrate and photoresist layer are then etched using the feature patterns as a mask.

Career Highlights

Hsiu-Chun Lee has worked with notable companies in the semiconductor industry, including Nan Ya Technology Corporation and Nanya Technology Corporation. His experience in these organizations has contributed to his expertise and innovative capabilities in semiconductor manufacturing.

Collaborations

Throughout his career, Hsiu-Chun Lee has collaborated with talented individuals, including Yi-Nan Chen and Hsien-Wen Liu, who have contributed to his projects and innovations.

Conclusion

Hsiu-Chun Lee's contributions to semiconductor technology through his patents and collaborations highlight his role as an influential inventor in the field. His innovative methods continue to impact the industry and drive advancements in semiconductor manufacturing.