Hsin-Yu Hsieh

Title: Hsin-Yu Hsieh: Innovator in Semiconductor Technology

Introduction

Hsin-Yu Hsieh is a prominent inventor based in Tainan, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 4 patents. His innovative work focuses on methods that enhance the precision and efficiency of lithographic tools used in semiconductor manufacturing.

Latest Patents

Hsieh's latest patents include a "Method for correcting critical dimension measurements of lithographic tool." This method involves providing a correction pattern on a lithographic mask, measuring critical dimensions of developed patterns, and adjusting exposure conditions based on measurement bias values. Another notable patent is the "Method of forming a semiconductor device," which outlines a process for creating a semiconductor device by forming a metal nitride barrier layer and selectively removing a titanium layer to expose the barrier layer.

Career Highlights

Hsin-Yu Hsieh is currently employed at United Microelectronics Corporation, a leading company in the semiconductor industry. His work has been instrumental in advancing the technology used in semiconductor fabrication, contributing to the development of more efficient and reliable devices.

Collaborations

Hsieh has collaborated with several talented individuals in his field, including Kuan-Ying Lai and Chang-Mao Wang. These collaborations have fostered innovation and have led to the successful development of new technologies in semiconductor manufacturing.

Conclusion

Hsin-Yu Hsieh's contributions to semiconductor technology through his patents and collaborations highlight his role as a key innovator in the industry. His work continues to influence advancements in the field, making a lasting impact on technology.