Company Filing History:
Years Active: 2009
Title: Hsin Tai: Innovator in Semiconductor Technology
Introduction
Hsin Tai is a prominent inventor based in Taipei, Taiwan. He has made significant contributions to the field of semiconductor technology, holding 2 patents that showcase his innovative approaches to manufacturing transistors.
Latest Patents
Hsin Tai's latest patents include a "Method for manufacturing MOS transistors utilizing a hybrid hard mask." This method involves providing a substrate with a dielectric layer and a polysilicon layer, forming a hybrid hard mask, and performing etching processes to create a gate structure and recesses for epitaxial silicon layers. Another notable patent is the "Method of fabricating strained-silicon transistors and strained-silicon CMOS transistors." This method outlines the steps for creating strained-silicon transistors, including etching processes, oxygen flushes, and selective epitaxial growth to form source/drain regions.
Career Highlights
Hsin Tai is currently employed at United Microelectronics Corporation, where he continues to push the boundaries of semiconductor technology. His work has been instrumental in advancing the manufacturing processes of transistors, contributing to the efficiency and performance of electronic devices.
Collaborations
Hsin Tai has collaborated with notable coworkers such as Chih-Ning Wu and Chung-Ju Lee, further enhancing the innovative environment at United Microelectronics Corporation.
Conclusion
Hsin Tai's contributions to semiconductor technology through his patents and work at United Microelectronics Corporation highlight his role as a key innovator in the field. His methods for manufacturing transistors are paving the way for advancements in electronic devices.