Hsien Jung Chen

Title: Hsien Jung Chen: Innovator in Semiconductor Technology

Introduction

Hsien Jung Chen is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly through his innovative patent related to semiconductor-on-insulator structures.

Latest Patents

Hsien Jung Chen holds a patent for "Semiconductor-on-insulator (SOI) semiconductor structures including a high-k dielectric layer and methods of manufacturing the same." This patent describes a layer stack that includes a first bonding dielectric material layer, a dielectric metal oxide layer, and a second bonding dielectric material layer formed over a substrate with a semiconductor layer. The process involves forming a conductive material layer by depositing a conductive material over the second bonding dielectric material layer. The substrate semiconductor layer is then thinned, allowing for the formation of a semiconductor device on the top semiconductor layer.

Career Highlights

Hsien Jung Chen is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work focuses on advancing semiconductor technologies and improving manufacturing processes.

Collaborations

Hsien Jung Chen has collaborated with notable colleagues, including Harry-Hak-Lay Chuang and Kuo-Ching Huang, contributing to various projects within the semiconductor field.

Conclusion

Hsien Jung Chen's innovative work in semiconductor technology exemplifies the advancements being made in this critical industry. His contributions continue to influence the development of modern electronic devices.