Hsiao-Lun Chang, an accomplished inventor based in Tainan, Taiwan, has made significant contributions to the field of extreme ultraviolet (EUV) lithography. With a remarkable portfolio of 13 patents, Chang stands out as a key figure in advancing the technologies that support modern semiconductor manufacturing.

Latest Patents

Two of Hsiao-Lun Chang's latest patents demonstrate his innovative prowess. The first, titled "EUV light source and apparatus for EUV lithography," introduces a metal reuse system designed to enhance the efficiency of an extreme ultraviolet radiation source. This system encompasses a first metal collector for gathering metal from the vanes of the EUV radiation source apparatus, a first metal storage linked to the collector through a conduit, a metal droplet generator connected to the storage via another conduit, and a first metal filtration device strategically positioned.

The second patent, "Replacement and refill method for droplet generator," outlines a unique method in which a photoresist-coated substrate is introduced to an EUV tool. In this process, EUV radiation is directed onto the substrate, generated by an excitation laser impacting a series of target droplets from a first droplet generator. Notably, the method specifies replacing the first droplet generator with a second unit at a temperature exceeding 150° C, showcasing an advancement in operational efficiency.

Career Highlights

Hsiao-Lun Chang is employed at Taiwan Semiconductor Manufacturing Company Limited (TSMC), where he applies his expertise in semiconductor technology to drive innovations in EUV lithography. His role at TSMC underscores his importance in a company that is pivotal to the global electronics industry, where precision and advanced technology are paramount.

Collaborations

In his professional journey, Chang collaborates with notable coworkers, including Li-Jui Chen and Po-Chung Cheng. These partnerships highlight the spirit of teamwork and shared expertise that is critical in the fast-evolving landscape of semiconductor research and development.

Conclusion

With his impressive array of patents and a dedicated career at TSMC, Hsiao-Lun Chang exemplifies the innovative spirit that is driving advancements in semiconductor technology. His contributions not only reflect his individual capabilities as an inventor but also signify the collaborative efforts essential for progress in the industry. As the demand for advanced lithography technologies continues to grow, inventors like Chang will play a crucial role in shaping the future of the semiconductor landscape.

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