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For the Inventor, By the Inventor

Medina, OH, United States of America

Horia M Faur

This inventor holds 10 USPTO granted patents and 1 published patent application and 2 EPO patents. Top assignees: Specmat Limited, Special Materials Research and Technology, Inc., Special Materials Research and Technology, Inc. (Specmat). Active years: 2000-2020.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Horia M Faur. Retrieved from https://idiyas.com/inventor/horia-m-faur

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 10 

% Patents Active = 100.0

 

Average Co-Inventor Count = 2.7

ph-index = 3

Forward Citations = 53(Granted Patents)


Location History:

  • North Olmsted, OH (US) (2000 - 2003)
  • Medina, OH (US) (2015 - 2020)

Company Filing History:

goldMedal5 out of 10 
 
Specmat Limited
 patents
silverMedal4 out of 4 
 
Special Materials Research and Technology, Inc.
 patents
bronzeMedal1 out of 1 
 
Special Materials Research and Technology, Inc. (Specmat)
 patent

Years Active: 2000-2020

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10 patents (USPTO):Explore Patents
1. 10622495 - Method, process and fabrication technology for oxide layers (2020-04-14),
2. 10619097 - Low-[HF] room temperature wet chemical growth (RTWCG) chemical formulation (2020-04-14),
3. 10529872 - Silicon-containing semiconductor structures, methods of making the same and devices including the same (2020-01-07),
4. 10526538 - Methods, process and fabrication technology for high-efficiency low-cost crystalline silicon solar cells (2020-01-07),
5. 10217893 - Methods, apparatus, and systems for passivation of solar cells and other semiconductor devices (2019-02-26),
6. 9068112 - Compositions to facilitate room temperature growth of an oxide layer on a substrate (2015-06-30),
7. 6613697 - Low metallic impurity SiO based thin film dielectrics on semiconductor substrates using a room temperature wet chemical growth process, method and applications thereof (2003-09-02),
8. 6593077 - Method of making thin films dielectrics using a process for room temperature wet chemical growth of SiO based oxides on a substrate (2003-07-15),
9. 6409889 - Method for the removal and recovery of inorganic pollutants from waste aqueous solutions and waste primary air sources (2002-06-25),
10. 6080683 - Room temperature wet chemical growth process of SiO based oxides on (2000-06-27),

Title: The Innovative Journey of Horia M Faur

Introduction:

Horia M Faur, a talented inventor hailing from Medina, Ohio, has made significant contributions to the field of technology and innovation.

Latest Patents:

Horia M Faur's latest patents showcase his dedication to pushing the boundaries of technology and creating solutions for real-world problems. His innovative spirit is evident in each patent, reflecting his commitment to excellence.

Career Highlights:

Throughout his illustrious career, Horia M Faur has demonstrated a keen ability to transform ideas into tangible inventions. His passion for innovation has led to the development of groundbreaking technologies that have made a positive impact on society.

Collaborations:

Horia M Faur has collaborated with leading experts in the industry, fostering a culture of creativity and collaboration. His ability to work effectively in teams has resulted in the successful development of cutting-edge inventions that have garnered widespread acclaim.

Conclusion:

In conclusion, Horia M Faur's remarkable journey as an inventor is a testament to his unwavering dedication to innovation. His pioneering spirit and commitment to excellence continue to inspire the next generation of inventors to push the boundaries of what is possible.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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