Honami Nawa

Title: Honami Nawa: Innovator in Photocurable and Heat-Dissipating Resin Compositions

Introduction

Honami Nawa is a prominent inventor based in Osaka, Japan. She has made significant contributions to the field of materials science, particularly in the development of photocurable compositions and heat-dissipating resin compositions. With a total of five patents to her name, Nawa continues to push the boundaries of innovation in her field.

Latest Patents

Nawa's latest patents include a photocurable composition that features a unique combination of components. This composition contains a component (A), which is a (meth)acrylic acid ester with 2 to 6 (meth)acryloyl groups in one molecule. Additionally, it includes a component (B), a thiol compound with 2 to 4 thiol groups, and a component (C), a photobase generator. The mass ratio of components (A) to (B) ranges from 66:34 to 33:67, ensuring optimal performance. Furthermore, her heat-dissipating resin composition incorporates a rubber material with an average emissivity of 80% or higher in the wavelength range from 5 μm to 20 μm. This innovative composition also includes a filler with specific grain diameter and aspect ratio, achieving an emissivity of 90% or higher.

Career Highlights

Nawa is currently employed at Panasonic Intellectual Property Management Co., Ltd., where she applies her expertise in developing advanced materials. Her work has garnered attention for its practical applications in various electronic devices, enhancing their performance and efficiency.

Collaborations

Throughout her career, Nawa has collaborated with notable colleagues, including Hirohisa Hino and Arata Kishi. These partnerships have contributed to her success and the advancement of her innovative projects.

Conclusion

Honami Nawa is a trailblazer in the field of materials science, with a focus on photocurable and heat-dissipating resin compositions. Her contributions through her patents reflect her commitment to innovation and excellence in her work.