Homer Z Chou

Title: The Innovative Contributions of Homer Z Chou

Introduction

Homer Z Chou is a notable inventor based in Schaumburg, IL (US), recognized for his significant contributions to the field of polishing systems and methods. With a total of 8 patents to his name, Chou has made strides in enhancing the efficiency and effectiveness of substrate polishing techniques.

Latest Patents

Among his latest patents, Chou has developed a method for polishing a memory or rigid disk using a phosphate ion-containing polishing system. This innovative method involves abrading the surface with a polishing composition that includes water, an oxidizing agent, and a phosphate ion or phosphonate ion concentration of about 0.04 M or higher. Additionally, he has created a system for planarizing or polishing substrates that incorporates silica particles. Another significant patent focuses on chemical-mechanical polishing systems for substrates containing low-k dielectric layers, which utilize an abrasive, a polishing pad, and an amphiphilic nonionic surfactant.

Career Highlights

Chou has had a distinguished career, working with prominent companies such as Cabot Microelectronics Corporation and Organic Display Technology. His work in these organizations has allowed him to refine his expertise in polishing technologies and contribute to advancements in the industry.

Collaborations

Throughout his career, Chou has collaborated with talented individuals, including Kevin J Moeggenborg and Jeffrey P Chamberlain. These collaborations have fostered innovation and have been instrumental in the development of his patented technologies.

Conclusion

Homer Z Chou's contributions to the field of polishing systems are noteworthy, with his innovative patents paving the way for advancements in substrate polishing techniques. His work continues to influence the industry and showcases the importance of innovation in technology.